Equipment for Deposition of High-temperature Superconducting Films by MOCVD Technology

Authors

  • J. Stejskal Department of Inorganic Chemistry, Institute of Chemical Technology, Prague

Abstract

An apparatus for deposition of 31igh-temperature superconducting thin films in the Y-Ba-Cu-O, Bi-Sr-Ca-Cu-O and Ti-Ba-Ca-Cu-O systems by metal-organic chemical vapour deposition (MOCVD) is presented. The reliability of the apparatus was verified by deposition and characterization of the CuO, Cu-Sr-O and Bi-Sr-Ca-Cu-O thin films. The apparatus will be used for preparation and study of Y-, Bi- and Tl-based oxide superconductor thin films.

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Published

1999-02-15

How to Cite

Stejskal, J. (1999). Equipment for Deposition of High-temperature Superconducting Films by MOCVD Technology. Chemické Listy, 93(1). Retrieved from http://www-.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/2643

Issue

Vol. 93 No. 1 (1999)

Section

Articles